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Osmium Diboride Compounds and Their Uses

机译:二硼化Compound化合物及其用途

摘要

According to the present invention, the valence electron density and a bond covalently second incompressible, specific for hard materials pole to verify that it can be used as a design parameter. Using this concept, we have improved the hardness to generate a local covalent bond by integrating the boron atom to osmium metal. Other compounds include the osmium and osmium nitride carbide. However, did not attempt to synthesize OsC is successful, OsN has recently been observed by the spectrometer was not obtained in pure form by crystallographic yet. [16] and the small size of the electron acceptor boron Because of the nature, we have to compounds of boron and osmium, OsB to hold almost all of the high valence electron density of the metal osmium 2 could form a The compound is combined with a high bulk modulus with a high hardness. Despite the crystal structure of the die osmium boride known, the mechanical properties were not good erasing characteristics. [17,18] ; The present invention is polishing the surface material or to include a way to cut through the material surface, which is the expression: ; Os x M 1 -x B 2 ; essentially as osmium compound having a die boride includes contacting the surface of the material consisting of abrasive. Here, M is rhenium, ruthenium or iron, and, x is from 0.01 to 1. However, if x is not a 1, M is rhenium, x is 0.01 to 0.3. Material that can be polished is a material that is not as hard as much as osmium die boride compound. For example, sapphire (2,000 kg / mm 2 of hardness), as well as, depending on the hardness of the individual die boride osmium compound used as an abrasive 3,000 kg / mm 2 is also a material having a hardness or more may be polished. ; This invention also, by grinding or any substance includes a method for protecting the surface from being cut. This method has the following formula ; Os x M 1 -x B 2 ; comprises coating the surface with a protective layer containing an osmium compound having a die boride. Here, M is rhenium, ruthenium or iron, and, x is from 0.01 to 1. However, if x is not a 1, M is rhenium, x is 0.01 to 0.3. The protective layer can protect the die from the osmium boride compound as much as non-rigid materials, as discussed above. ; The invention not only includes methods for using the osmium die boride compound, osmium compound, the tool die boride is used, the abrasive, and other devices and systems are also included. Osmium die boride compounds may be used in the same way as the pole rigid material known as diamond, tungsten carbide, etc.. Osmium boride compounds are the same die-hard or ultra-rigid pole desirable properties found in the known extreme hard materials, and many of them come without drawbacks.
机译:根据本发明,价电子密度和共价第二不可压缩的键对于硬质材料是特有的,以证明其可以用作设计参数。使用此概念,我们通过将硼原子整合到metal金属中来提高了硬度以产生局部共价键。其他化合物包括the和碳化nitride氮化物。但是,没有尝试合成OsC是成功的,最近通过光谱仪观察到OsN尚未通过结晶学获得纯形式。 [16] 和电子受体硼的小尺寸由于其性质,我们必须将硼和的化合物,OsB容纳几乎所有金属的高价电子密度> 2可能形成。该化合物与高堆积模量和高硬度结合在一起。尽管已知硼化die晶粒的晶体结构,但是机械性能不是良好的擦除特性。 [17,18] ;本发明是抛光表面材料或包括一种切穿材料表面的方法,其表达为: Os x M 1 -x B 2 ;基本上,具有模硼化物的化合物包括接触由磨料组成的材料的表面。在此,M为rh,钌或铁,并且x为0.01至1。但是,如果x不是1,则M为rh,x为0.01至0.3。可以抛光的材料的硬度不如硼化os化合物高。例如,蓝宝石(硬度为2,000 kg / mm 2 ),以及取决于用作研磨剂的单个模硼化物化合物的硬度3,000 kg / mm 2 还是具有硬度或更高硬度的材料。 ;本发明还通过研磨或任何物质包括保护表面不被切割的方法。该方法具有以下公式; Os x M 1 -x B 2 ;包括在表面上涂覆保护层,该保护层包含具有模硼化物的化合物。在此,M为rh,钌或铁,并且x为0.01至1。但是,如果x不是1,则M为rh,x为0.01至0.3。如上所述,保护层可以与非刚性材料一样多地保护管芯免受硼化化合物的侵害。 ;本发明不仅包括使用硼氢化化合物,化合物,使用硼化工具模具,研磨剂的方法,还包括其他装置和系统。 die硼化die化合物的使用方法可与称为金刚石,碳化钨等硬质合金的硬杆相同。硼化bo化合物具有已知的极硬材料中相同的硬模或超硬极理想的性能,其中许多都没有缺点。

著录项

  • 公开/公告号KR101167714B1

    专利类型

  • 公开/公告日2012-07-20

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20067026008

  • 发明设计人 카너 리차드 비.;길만 존 제이.;

    申请日2005-05-10

  • 分类号C01G55/00;

  • 国家 KR

  • 入库时间 2022-08-21 17:07:42

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