method for depositing silicon-series nanoparticle thin film, silicon-series nanoparticle thin film, and apparatus for depositing silicon-series nanoparticle thin film

摘要

Provided are a vapor deposition method of a silicon-based nanoparticle thin film, a silicon-based nanoparticle thin film, and a vapor deposition device of a silicon-based nanoparticle thin film. According to the present invention, the vapor deposition method of a silicon-based nanoparticle thin film comprises: the preparation step of preparing silicon-based nanoparticles; and the vapor deposition step of first vapor depositing the silicon-based nanoparticles on a substrate. According to the present invention, the vapor deposition method and device of a silicon-based nanoparticle thin film prepare silicon-based nanoparticles and simultaneously vapor deposit the prepared silicon-based nanoparticles on a substrate without pretreating the prepared silicon-based nanoparticles in another process, and thus it is possible to prevent the deterioration of battery efficiency due to the contamination of nanoparticles. In addition, since preparation and vapor deposit happens in a single system, economical efficiency is excellent. Further, it is possible to vapor deposit a desired shape of the nanoparticle thin film on a large-area substrate by adjusting the speed of nanoparticles and the height of the substrate.