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Processing method of large area structure in low cost type stereolithography system using small DMD and UV-LED

机译:使用小DMD和UV-LED的低成本型立体光刻系统中大面积结构的处理方法

摘要

PURPOSE: A method for processing a structure having a wide area in a low-cost stereolithography system using a small DMD(Digital Micromirror Device) and a UV(Ultraviolet)-LED(Light Emitting Diode) is intended to provide a microstructure and a wide area of a mesostructure at high precision using a projection method and a scanning method properly. CONSTITUTION: A method for processing a structure having a wide area in a low-cost stereolithography system using a small DMD and a UV-LED is as follows. A three-dimensional model is transformed to a STL(Stereolithography) file. The STL file is sliced to lamination thickness, and a sectional image is created. The sectional image is split according to each unit area to obtain U(Ux,Uy) coordinates. The DMD (x,y) coordinate of a stage is detected by transfer of X and Y stages. If the U coordinates are the same to the DMD coordinates, the information on a unit area corresponding to the U coordinate is transferred to a DMD.
机译:用途:在使用小DMD(数字微镜器件)和UV(紫外线)-LED(发光二极管)的低成本立体光刻系统中处理具有大面积结构的方法的方法旨在提供微结构和宽广的适当地使用投影方法和扫描方法以高精度测量介孔结构的面积。构成:在使用小DMD和UV-LED的低成本立体光刻系统中处理具有大面积结构的方法如下。将三维模型转换为STL(立体光刻)文件。将STL文件切成薄片厚度,然后创建截面图像。根据每个单位区域对截面图像进行分割,以获得U(Ux,Uy)坐标。通过X和Y位移台检测位移台的DMD(x,y)坐标。如果U坐标与DMD坐标相同,则与U坐标相对应的单位区域上的信息被传送到DMD。

著录项

  • 公开/公告号KR101199496B1

    专利类型

  • 公开/公告日2012-11-09

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20100051260

  • 发明设计人 박인백;하영명;

    申请日2010-05-31

  • 分类号B29C67;

  • 国家 KR

  • 入库时间 2022-08-21 17:07:14

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