Use of a supercritical fluid to the drying of the disks and for cleaning the lenses in a lithography

摘要

Always ion lithography system (100; 400; 500) with:a source for a a photochemical to radiation, a lens (108), an immersion liquid and an increasingly ion space region (110) for holding the immersion liquid in contact with the lens (108) and in contact with a photoresist (104), the on a disk (102, 506) is arranged;a source of a supercritical fluid;a valve system (112, 114, 116, 118), which is formed, the immersion liquid of the ever ion space region removed, and the ever ion space region with the supercritical fluid to be filled, wherein the valve system is further designed, the supercritical fluid from the ion space region always to be dissipated and the increasingly ion space region to be filled with the immersion liquidand the further comprises:a monitoring component (504), which is formed, material of the lens (108) and / or in the immersion liquid and / or in the ever ion space region and / or on the photoresist (104) can be seen; anda control component (406; 502), which is configured, the valve system is controlled in such a way that the..