首页> 外国专利> Device, useful for drying polysilicon, comprises a process shell for receiving polysilicon, a perforated air separation plate, which is placed on the shell process, a filter and/or an air supply

Device, useful for drying polysilicon, comprises a process shell for receiving polysilicon, a perforated air separation plate, which is placed on the shell process, a filter and/or an air supply

机译:用于干燥多晶硅的装置包括:用于容纳多晶硅的工艺壳体,置于壳体工艺上的多孔空气分离板,过滤器和/或空气供应装置

摘要

Device comprises a process shell (2) for receiving polysilicon; a perforated air separation plate (1), which is placed on the shell process; a filter (4) and/or an air supply (3). An independent claim is included for drying polysilicon comprising passing an air stream with a flow rate of 0.1-3 m/s and a temperature of 20-100[deg] C through the filter and subsequently passing through the perforated air separation plate; and drying the process shell containing polysilicon.
机译:该装置包括用于容纳多晶硅的处理壳(2);穿孔的空气分离板(1),放置在壳工艺上;过滤器(4)和/或气源(3)。包括用于干燥多晶硅的独立权利要求,其包括使流速为0.1-3m / s,温度为20-100℃的空气流通过过滤器,然后通过多孔的空气分离板。并干燥包含多晶硅的处理壳。

著录项

  • 公开/公告号DE102011004916A1

    专利类型

  • 公开/公告日2012-09-06

    原文格式PDF

  • 申请/专利权人 WACKER CHEMIE AG;

    申请/专利号DE20111004916

  • 发明设计人 WOCHNER HANNS DR.;

    申请日2011-03-01

  • 分类号C01B33/02;F26B3/02;

  • 国家 DE

  • 入库时间 2022-08-21 17:05:04

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