首页> 外国专利> Micro-mechanical arrangement for manufacturing thin polysilicon layer utilized as e.g. strip conductor, has hole pairs connected with micro-mechanical functional area over contact plugs and disconnected from area by gap

Micro-mechanical arrangement for manufacturing thin polysilicon layer utilized as e.g. strip conductor, has hole pairs connected with micro-mechanical functional area over contact plugs and disconnected from area by gap

机译:用于制造薄多晶硅层的微机械装置例如用作带状导体,孔对与接触插塞上的微机械功能区域相连,并通过间隙与该区域断开连接

摘要

The arrangement has a micro-mechanical functional area (P1a) i.e. polysilicon functional region, arranged in a plane above a silicon substrate (S). A sub region is attached on the micro-mechanical functional area and connected with another sub region, where the former sub region is formed in bar shape. The latter sub region is connected with the substrate. Hole pairs are reciprocally arranged between the sub regions and connected with the functional area over contact plugs. The hole pairs are disconnected from the functional area by a gap that is formed between the hole pairs. An independent claim is also included for a method for manufacturing a micro-mechanical device.
机译:该布置具有布置在硅衬底(S)上方的平面中的微机械功能区域(P1a),即多晶硅功能区域。子区域附接在微机械功能区域上并且与另一个子区域连接,其中前一个子区域形成为条形。后一个子区域与基板连接。孔对在子区域之间相互排列,并与功能区域通过接触塞连接。孔对通过在孔对之间形成的间隙与功能区域断开连接。还包括用于制造微机械装置的方法的独立权利要求。

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