首页> 外国专利> Barrier layer field effect transistor arrangement comprises node which is provided as drain terminal of arrangement, where another node is provided as source terminal of arrangement, where third node is provided as gate terminal

Barrier layer field effect transistor arrangement comprises node which is provided as drain terminal of arrangement, where another node is provided as source terminal of arrangement, where third node is provided as gate terminal

机译:势垒层场效应晶体管装置包括提供为装置的漏极端子的节点,提供另一个节点为装置的源极端子,其中提供第三节点作为栅极端子。

摘要

The barrier layer field effect transistor arrangement (100) comprises a node (101) which is provided as a drain terminal of the arrangement. Another node (102) is provided as a source terminal of the arrangement. Third node (103) is provided as a gate terminal of the arrangement. A capacitor (30) is arranged between the fourth node (104) and the third node. A field effect transistor (20) is a metal-oxide-semiconductor field-effect transistor.
机译:势垒层场效应晶体管布置(100)包括被设置为布置的漏极端子的节点(101)。提供另一个节点(102)作为该装置的源终端。提供第三节点(103)作为该装置的栅极端子。在第四节点(104)和第三节点之间布置电容器(30)。场效应晶体管(20)是金属氧化物半导体场效应晶体管。

著录项

  • 公开/公告号DE102011083684B3

    专利类型

  • 公开/公告日2012-07-19

    原文格式PDF

  • 申请/专利权人 SIEMENS AKTIENGESELLSCHAFT;

    申请/专利号DE20111083684

  • 发明设计人 MELKONYAN ASHOT;

    申请日2011-09-29

  • 分类号H03K17/687;

  • 国家 DE

  • 入库时间 2022-08-21 17:04:50

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