首页> 外国专利> Method for supplying process gases e.g. helium gas during photovoltaic and semiconductor production, involves temporarily and/or partially supplying helium-rich stream withdrawn from cryogenic helium enrichment

Method for supplying process gases e.g. helium gas during photovoltaic and semiconductor production, involves temporarily and/or partially supplying helium-rich stream withdrawn from cryogenic helium enrichment

机译:供应过程气体的方法,例如光伏和半导体生产过程中的氦气涉及暂时和/或部分供应从低温氦气浓缩中抽出的富氦流

摘要

The method involves providing helium gas and nitrogen gas stream in liquid form. Extracted helium-containing exhaust gas stream is partly subjected to cryogenic helium enrichment. The natural gas and liquid helium are provided in the liquid form for temporarily and/or partially cooling the helium-containing exhaust gas. Helium-rich stream is withdrawn from the cryogenic helium enrichment via a spacer and temporarily and/or partially supplied for flat glass production. Liquid nitrogen and the liquid helium are stored in storage vessels (S1, S2).
机译:该方法包括提供液态氦气和氮气流。提取的含氦废气流部分进行了低温氦浓缩。以液态形式提供天然气和液态氦,以暂时和/或部分冷却含氦的废气。经由间隔器从低温氦气富集中抽出富氦流,并暂时和/或部分供应其以生产平板玻璃。液氮和液氦存储在存储容器(S1,S2)中。

著录项

  • 公开/公告号DE102011100580A1

    专利类型

  • 公开/公告日2012-11-08

    原文格式PDF

  • 申请/专利权人 LINDE AG;

    申请/专利号DE201110100580

  • 发明设计人 LOSE NIELS;BOHN MATTHIAS;

    申请日2011-05-05

  • 分类号F25J3/06;F25J3/08;

  • 国家 DE

  • 入库时间 2022-08-21 17:04:51

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