Measuring device for detecting position of lithography mask support structure, has two distance sensor devices among which second device has measuring surfaces whose extension is smaller than movement distance of support structure

摘要

The device has first distance sensor device (48.1) for detecting position of support structure (28) based on first translation direction (x). A second distance sensor device (48.3,48.4) for detecting position of measuring body based on second translation direction (z) which is perpendicular to the first direction of translation. An extension (LM) of the measuring surface (56b,56c) of second distance sensor device in first translation direction is smaller than the movement distance (Dx) of support structure in first translation direction. Independent claims are included for the following: (1) positioning device for positioning support structure for lithography mask; and (2) metrology system for measuring position of lithography mask.