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Device for measuring temperature field of analysis area of microelectromechanical system, in local multiphysics analysis assembly, has processing unit for deducting processed reference flux from object flux to obtain temperature field
Device for measuring temperature field of analysis area of microelectromechanical system, in local multiphysics analysis assembly, has processing unit for deducting processed reference flux from object flux to obtain temperature field
The device has a mirror (7) for switching from an analysis area (10) of an object (1) to a reference area (6). The unit cooperates with a detection unit so that the detection unit detects only an object infrared radiation flux emitted by the analysis area when the mirror is in a switching state, and a reference infrared radiation flux emitted by the reference area when the mirror is in another switching state. A processing unit (5) processes the detected fluxes, and deducts the processed reference flux from the processed object flux to obtain temperature field of the analysis area. An independent claim is also included for a local multiphysics analysis assembly.
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