MASK SUBSTRATE, PHOTOMASK, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, MANUFACTURING METHOD OF MASK SUBSTRATE, MANUFACTURING METHOD OF PHOTOMASK, AND MANUFACTURING SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a mask substrate that can suppress exposure failure arising from thermal deformation of a photomask by irradiation of exposure light.;SOLUTION: The mask substrate comprises: a first member 101 on which a mask pattern is formed; and a second member 102 that is joined to at least a part of the first member and is different in a coefficient of thermal expansion from the first member. The first member 101 contains silicon dioxide(SiO2). In an embodiment, the first member 101 contains quartz glass. In the embodiment, the first member 101 contains quartz glass as a main component. The first member 101 may contain silicon dioxide and a substance different from silicon dioxide. The second member 102 has the coefficient of thermal expansion larger than that of the first member 101. In the embodiment, the second member 102 contains calcium fluoride(CaF2). In the embodiment, the second member 102 contains fluorite. In the embodiment, the second member 102 contains calcium fluoride as a main component.;COPYRIGHT: (C)2013,JPO&INPIT