OPTICAL DEVICE, SPATIAL FILTER, SHADING METHOD, AND SETTING METHOD FOR SPATIAL FILTER

摘要

PROBLEM TO BE SOLVED: To provide a foreign matter detection method and a foreign matter inspection device for highly accurately detecting defects of wafers having patterns, such as semiconductor devices, liquid crystal substrates and media or the like.;SOLUTION: An inspecting device comprises: an irradiation optical system which radiates light to a substrate to be inspected; a detection optical system which detects the light from the substrate to be inspected; and a spatial filter which blocks the diffracted light from the substrate to be inspected. In the inspecting device, the spatial filter comprises: a plurality of light blocking members; a control member which changes at least a shape, an angle or an interval of the blocking members; and a control unit which controls the control member.;COPYRIGHT: (C)2013,JPO&INPIT