首页> 外国专利> POLISHING CARRIER, METHOD FOR POLISHING GLASS SUBSTRATE FOR MAGNETIC RECORDING MEDIUM, AND METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MAGNETIC RECORDING MEDIUM

POLISHING CARRIER, METHOD FOR POLISHING GLASS SUBSTRATE FOR MAGNETIC RECORDING MEDIUM, AND METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MAGNETIC RECORDING MEDIUM

机译:抛光载体,用于磁记录介质的玻璃基质的抛光方法以及用于磁记录介质的玻璃基质的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a polishing carrier that can prevent an upper surface plate from sticking to a polishing pad, without causing a damage to the polishing pad during a polishing process.;SOLUTION: The polishing carrier is used for polishing a glass substrate for magnetic recording medium, wherein the polishing carrier has two main flat surfaces of a first surface and a second surface, and the surface roughness (Ra) of a first surface is larger than that of a second surface, with the difference in 3-15 μm. A method for polishing the glass substrate for magnetic recording medium, and a method for manufacturing the glass substrate for magnetic recording medium, are also provided.;COPYRIGHT: (C)2013,JPO&INPIT
机译:解决的问题:提供一种抛光载体,该抛光载体可以防止上表面板粘附到抛光垫上,而不会在抛光过程中损坏抛光垫。;解决方案:该抛光剂用于抛光玻璃基板。用于磁记录介质,其中抛光载体具有第一表面和第二表面的两个主平坦表面,并且第一表面的表面粗糙度(Ra)大于第二表面的表面粗糙度(Ra),差为3-15微米还提供了一种用于磁记录介质的玻璃基板的抛光方法以及一种用于磁记录介质的玻璃基板的制造方法。;版权所有:(C)2013,JPO&INPIT

著录项

  • 公开/公告号JP2013132745A

    专利类型

  • 公开/公告日2013-07-08

    原文格式PDF

  • 申请/专利权人 ASAHI GLASS CO LTD;

    申请/专利号JP20110286739

  • 发明设计人 OTSUKA HARUHIKO;MISHIRO HITOSHI;

    申请日2011-12-27

  • 分类号B24B37/28;B24B7/24;G11B5/84;

  • 国家 JP

  • 入库时间 2022-08-21 17:02:14

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