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Gold-plating membrane structure, being the gold-plating membrane structure which was formed to the glass ceramic wiring

机译:镀金膜结构,是在玻璃陶瓷配线上形成的镀金膜结构

摘要

PROBLEM TO BE SOLVED: To reduce the occurrence of problems such as a glitch of abnormal deposition of gold in between wiring patterns of a LTCC substrate, poor adhesion between a gold film and a nickel plating film, a phenomenon of repelling solder, and a strength deterioration of a soldered joint.;SOLUTION: A structure of a gold plating film comprises: a first layer structure of a nickel-phosphorus alloy formed on a wiring pattern of a metallic sintered compact by using an electroless nickel plating solution which uses approximately neutral hypophosphite as a reducing agent; a second layer structure of a nickel-phosphorous alloy that is amorphous and does not contain sulfur, which is formed on the first layer structure by using an electroless nickel plating solution that forms such a layer structure as to contain 7 wt.% or more phosphorous and not to contain a sulfur component; a third layer structure of gold formed on the second layer structure by using a displacement type electroless gold plating solution; and a fourth layer structure of gold formed on the third layer structure by using a reduction type electroless gold plating solution.;COPYRIGHT: (C)2009,JPO&INPIT
机译:要解决的问题:减少诸如在LTCC基板的布线图案之间出现金异常沉积故障,金膜与镀镍膜之间的粘附力差,焊锡排斥现象和强度问题之类的问题的发生。解决方案:镀金膜的结构包括:镍-磷合金的第一层结构,其通过使用化学镀镍溶液形成在金属烧结体的布线图案上,该化学镀镍溶液使用近似中性的次磷酸盐作为还原剂;非晶态且不含硫的镍-磷合金的第二层结构,该第二层结构是通过使用化学镀镍溶液在第一层结构上形成的,该化学镀镍溶液形成了这样的层结构,该层结构中含有7重量%或更多的磷并且不包含硫成分;通过置换型化学镀金溶液在第二层结构上形成金的第三层结构;使用还原型化学镀金溶液在第三层结构上形成金的第四层结构。版权所有:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP5207782B2

    专利类型

  • 公开/公告日2013-06-12

    原文格式PDF

  • 申请/专利权人 三菱電機株式会社;

    申请/专利号JP20080059837

  • 发明设计人 市井 卓也;藤田 実;

    申请日2008-03-10

  • 分类号C23C18/52;H05K3/24;

  • 国家 JP

  • 入库时间 2022-08-21 17:00:22

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