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SILICONE EMBEDDED GLASS SUBSTRATE AND MANUFACTURING METHOD THEREFOR, SILICONE EMBEDDED GLASS MULTILAYER SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND ELECTROSTATIC ACCELERATION SENSOR
SILICONE EMBEDDED GLASS SUBSTRATE AND MANUFACTURING METHOD THEREFOR, SILICONE EMBEDDED GLASS MULTILAYER SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND ELECTROSTATIC ACCELERATION SENSOR
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机译:硅胶嵌入式玻璃基板及其制造方法,硅胶嵌入式玻璃多层基板及其制造方法以及静电加速度传感器
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摘要
PROBLEM TO BE SOLVED: To provide a silicon embedded glass substrate in which silicon is embedded with high location accuracy and which has small warpage, and a manufacturing method for the silicon embedded glass substrate.;SOLUTION: In a silicon embedded glass substrate, silicon is embedded in a glass substrate having a first principal surface and a second principal surface. The glass substrate includes a first glass layer and a second glass layer which have linear expansion coefficients differing from each other. A surface of the first glass layer makes up the first principal surface, and a surface of the second glass layer makes up the second principal surface.;COPYRIGHT: (C)2013,JPO&INPIT
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