首页> 外国专利> SILICONE EMBEDDED GLASS SUBSTRATE AND MANUFACTURING METHOD THEREFOR, SILICONE EMBEDDED GLASS MULTILAYER SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND ELECTROSTATIC ACCELERATION SENSOR

SILICONE EMBEDDED GLASS SUBSTRATE AND MANUFACTURING METHOD THEREFOR, SILICONE EMBEDDED GLASS MULTILAYER SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND ELECTROSTATIC ACCELERATION SENSOR

机译:硅胶嵌入式玻璃基板及其制造方法,硅胶嵌入式玻璃多层基板及其制造方法以及静电加速度传感器

摘要

PROBLEM TO BE SOLVED: To provide a silicon embedded glass substrate in which silicon is embedded with high location accuracy and which has small warpage, and a manufacturing method for the silicon embedded glass substrate.;SOLUTION: In a silicon embedded glass substrate, silicon is embedded in a glass substrate having a first principal surface and a second principal surface. The glass substrate includes a first glass layer and a second glass layer which have linear expansion coefficients differing from each other. A surface of the first glass layer makes up the first principal surface, and a surface of the second glass layer makes up the second principal surface.;COPYRIGHT: (C)2013,JPO&INPIT
机译:解决的问题:提供一种硅嵌入玻璃基板,该硅嵌入玻璃基板中嵌入的硅具有较高的位置精度并且翘曲较小,并且提供了一种用于该硅嵌入玻璃基板的制造方法。嵌入在具有第一主表面和第二主表面的玻璃基板中。所述玻璃基板包括具有彼此不同的线性膨胀系数的第一玻璃层和第二玻璃层。第一玻璃层的表面组成第一主表面,第二玻璃层的表面组成第二主表面。;版权所有:(C)2013,JPO&INPIT

著录项

  • 公开/公告号JP2013036829A

    专利类型

  • 公开/公告日2013-02-21

    原文格式PDF

  • 申请/专利权人 PANASONIC CORP;

    申请/专利号JP20110172677

  • 发明设计人 OKUMURA MAKOTO;

    申请日2011-08-08

  • 分类号G01P15/125;

  • 国家 JP

  • 入库时间 2022-08-21 16:59:31

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