首页> 外国专利> POLYHEDRAL STRUCTURE POLYSILOXANE DENATURED BODY, COMPOSITION INCLUDING THE DENATURED BODY, AND CURED PRODUCT OBTAINED BY CURING THE COMPOSITION

POLYHEDRAL STRUCTURE POLYSILOXANE DENATURED BODY, COMPOSITION INCLUDING THE DENATURED BODY, AND CURED PRODUCT OBTAINED BY CURING THE COMPOSITION

机译:多面结构聚硅氧烷变性体,包括变性体的组合物以及通过固化得到的固化产物

摘要

PROBLEM TO BE SOLVED: To provide a polysiloxane-based composition having high heat resistance and light resistance, excellent in gas barrier properties and thermal shock resistance, and good in handleability when sealing an optical semiconductor element.;SOLUTION: This polysiloxane-based composition includes: (A) a polyhedral structure polysiloxane denatured body obtained by hydrosilylation reaction of an alkenyl group-containing polyhedral structure polysiloxane-based compound (a), a hydrosilyl group-containing compound (b), and an organosilicon compound (c) having one alkenyl group in one molecule; and (B) a compound having two or more alkenyl groups.;COPYRIGHT: (C)2013,JPO&INPIT
机译:解决的问题:提供一种具有高耐热性和耐光性,优异的阻气性和耐热冲击性,以及在密封光学半导体元件时良好的可操作性的基于聚硅氧烷的组合物;解决方案:该基于聚硅氧烷的组合物包括:(A)通过含烯基的多面体结构聚硅氧烷类化合物(a),含氢硅烷基的化合物(b)和具有一个烯基的有机硅化合物(c)的氢化硅烷化反应得到的多面体结构聚硅氧烷变性体。一分子团; COPYRIGHT:(C)2013,JPO&INPIT;和(B)具有两个或多个烯基的化合物。

著录项

  • 公开/公告号JP2013057032A

    专利类型

  • 公开/公告日2013-03-28

    原文格式PDF

  • 申请/专利权人 KANEKA CORP;

    申请/专利号JP20110197211

  • 发明设计人 MANABE TAKAO;NISHIYAMA YOSHITAKA;

    申请日2011-09-09

  • 分类号C08L83/05;C08L83/07;C08G77/50;C08G77/38;

  • 国家 JP

  • 入库时间 2022-08-21 16:58:32

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