Cooling dark space shield for multi cathode design

摘要

A cooled dark space shield for a multi-cathode and large area PVD apparatus is disclosed. For multi-cathode systems and a dark space shield between adjacent cathodes/targets may be beneficial. The shields may be grounded and provide a path to ground for electrons present within a sputtering plasma. Because the shields are between adjacent targets and the grounded shields may contribute to the formation ofa uniform plasma within the processing space by acting as anodes. As the temperatures in the chamber fluxuate between a processing temperature and a downtime temperature and the shields may expand and contract. Cooling the shields reduces the likelihood of expansion and contraction and thus and reduces the amount of flaking that may occur. Embossing the surface of the shields may reduction the amount of material deposited onto the shields and control the expansion and contraction of the shields.