Production manner of substrate central processing unit and semiconductor equipment and modus operandi of substrate central processing unit

摘要

P To carry ON a substrate process without interrupting a recipe even if an error is caused by a small-amount leak. PSOLUTION: A substrate processing apparatus for executing a prescribed process ON a substrate loaded into a process chamber by running a recipe containing a plurality of steps is provided. The recipe includes a process step of processing the substrate as specified and a leak check step executed before the process step to check whether a leak occurs inside the process chamber. The substrate processing apparatus includes a main control unit configured to execute the process step while keeping a leak check error that occurs in the leak check step even when such an error occurs and the main control unit being configured to bring the recipe to an abnormal end if the leak check error hinders the execution of the processing step and to continue and bring the recipe to an end without executing a prescribed error processing when the leak check error does not hinder the execution of the process step. PCOPYRIGHT: (C)2011 and JPO& INPIT