PROBLEM TO BE SOLVED: To provide a method for forming an inorganic film, capable of yielding the inorganic film by a heat-treatment at a low temperature and a simple method, wherein the resulting inorganic film is excellent in adhesion to a substrate and transparency, has uniform thickness and is microscopically smooth.;SOLUTION: In the method for forming an inorganic film, a coating solution for forming an inorganic film is atomized and applied to a substrate so as to form the inorganic film. The coating solution comprises: stannic acid (A); at least one compound (B) chosen from the group consisting of ammonia, tetramethylammonium hydroxide and an amine that has a boiling point of ≤150°C under atmospheric pressure and shows solubility of ≥5 mass% in water at 20°C; water (C); and a solvent (D) that has a boiling point of 60-120°C under atmospheric pressure and shows water solubility of ≥40 mass% at 20°C.;COPYRIGHT: (C)2010,JPO&INPIT
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