Plasma reactor having a coil antenna of the symmetrical parallel conductor

摘要

The present invention is implemented in a plasma reactor for processing a semiconductor workpiece. Gas input can be a vacuum chamber having a ceiling and side walls, introducing a process gas workpiece support pedestal, the chamber facing the ceiling is generally within the chamber, and is in the above the ceiling, the reactor, one at least approximately from the axis of symmetry I include parallel conductor coil antenna which is interleaved solenoidal multiple first conductor wound around a substantially vertical axis of symmetry in the heavens in helical solenoid coaxial which are still displaced laterally as. Helical solenoids each of which is offset from the helical conductor of the other. In another embodiment, is in the above the ceiling antenna, segmentation of the solenoid on having multiple first conductor wound around a substantially vertical axis of symmetry in the heavens in helical solenoid juxtaposing coaxially each It is a parallel conductor coil antenna that is. The helical solenoid nearest other in a direction perpendicular to the axis of symmetry, is offset by a distance of the size of the conductor width of the conductor of the multiple helical solenoid Each diameters slightly different each helical solenoids thereby have.