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The CuNiSi based copper alloy board and its production manner whose resistance die worn Characteristic and shearing processability are satisfactory

机译:电阻模磨损特性和剪切加工性能均令人满意的CuNiSi基铜合金板及其生产方式

摘要

A Cu-Ni-Si based copper alloy sheet which has an excellent die abrasion resistance and a good shear processability while maintaining a sufficient strength and a sufficient conductivity, said Cu-Ni-Si based copper alloy sheet comprising 1.0-4.0 mass% of Ni, 0.2-0.9 mass% of Si and the balance consisting of Cu and unavoidable impurities, wherein the number of Ni-Si precipitate grains having a grain size of 20-80 nm present on the surface thereof is 1.5×106 to 5.0×106/mm2 and the number of Ni-Si precipitate grains having a grain size exceeding 100 nm present on the surface thereof is 0.5×105 to 4.0×105/mm2. In the Cu-Ni-Si based copper alloy sheet, the ratio a/b [wherein a stands for the number (grains/mm2) of Ni-Si precipitate grains having a grain size of 20-80 nm that are present in a surface layer extending from the surface to the depth corresponding to 20% of the thickness of the whole sheet; and b stands for the number (grains/mm2) of Ni-Si precipitate grains having a grain size of 20-80 nm that are present below the surface layer] is in the range of 0.5-1.5, and the concentration of Si solid-soluted in crystal grains present in an area at a depth of less than 10 mum from the surface is 0.03-0.4 mass%.
机译:具有优异的模头耐磨性和良好的剪切加工性同时保持足够的强度和足够的导电性的Cu-Ni-Si基铜合金板,所述Cu-Ni-Si基铜合金板包含1.0-4.0质量%的Ni ,Si为0.2〜0.9质量%,余量由Cu和不可避免的杂质构成,其表面上存在的粒径为20〜80nm的Ni-Si析出晶粒的数量为1.5×106〜5.0×106 /存在于其表面上的具有大于100nm的粒径的Ni-Si析出晶粒的数量为0.5×105至4.0×105 / mm 2。在Cu-Ni-Si基铜合金薄板中,比率a / b [其中a代表存在于表面中的具有20-80nm的晶粒尺寸的Ni-Si析出晶粒的数量(晶粒/ mm 2)。从表面延伸到对应于整个片材厚度的20%的深度的层; b表示存在于表面层下方的,晶粒尺寸为20-80 nm的Ni-Si析出晶粒的数量(晶粒/ mm2)在0.5-1.5的范围内,并且Si固存在于距表面小于10μm的区域的晶粒中的固溶率为0.03〜0.4质量%。

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