首页> 外国专利> Method for manufacturing wiring structure manufacturing method, device, device, droplet discharge head, of the droplet discharge head, and liquid droplet ejection apparatus

Method for manufacturing wiring structure manufacturing method, device, device, droplet discharge head, of the droplet discharge head, and liquid droplet ejection apparatus

机译:配线结构的制造方法,制造方法,装置,装置,液滴喷出头的液滴喷出头以及液滴喷出装置

摘要

PROBLEM TO BE SOLVED: To provide a highly reliable wiring structure which can pass electricity while preventing disconnection between step differences, and also to provide a device, a manufacturing method for the device, a liquid droplet ejection head, a manufacturing method for the liquid droplet ejection head, and a liquid droplet ejector.;SOLUTION: The wiring structure 500 has an upper substrate 20 joined via an adhesive layer 3 onto a lower substrate 10, and is equipped with a wiring line 34 drawn from a top face side of the upper substrate 20 through a side face to a top face side of the lower substrate 10. A projecting part T which contacts the top face side of the lower substrate 10 is formed at an outer edge of a joining face side to the lower substrate 10 of the upper substrate 20. The wiring line 34 is drawn to the top face side of the lower substrate 10 passing a surface of the projecting part T, and electrically connects a first conductive part 90 formed at the top face side of the lower substrate 10 and a second conductive part 44 formed at the top face side of the upper substrate 20 with each other.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种高度可靠的配线结构,该配线结构可以在防止阶梯差之间断开的同时使电流通过,并且还提供一种装置,该装置的制造方法,液滴喷射头,以及液滴的制造方法。解决方案:布线结构500具有通过粘合剂层3接合到下基板10上的上基板20,并且配备有从上基板的顶面侧引出的布线34。基板20通过下基板10的侧面到顶面侧。在下基板10的下基板10的接合面侧的外缘形成有与下基板10的顶面侧接触的突出部T。配线34穿过突出部T的表面被引到下基板10的顶面侧,并且电连接形成在顶面sid上的第一导电部90。下基板10的e和第二导电部分44彼此形成在上基板20的顶面侧。版权所有:(C)2008,JPO&INPIT

著录项

  • 公开/公告号JP5082285B2

    专利类型

  • 公开/公告日2012-11-28

    原文格式PDF

  • 申请/专利权人 セイコーエプソン株式会社;

    申请/专利号JP20060120419

  • 发明设计人 依田 剛;

    申请日2006-04-25

  • 分类号B41J2/045;B41J2/055;B41J2/16;

  • 国家 JP

  • 入库时间 2022-08-21 16:54:13

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号