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Method of manufacturing a platinum / tungsten oxide-based hydrogen sensitive film

机译:铂/氧化钨类氢敏感膜的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a Pt/WO3 type hydrogen sensitive film which enables the formation of the Pt/WO3 type hydrogen sensitive film on a base material having no heat resistance.;SOLUTION: The method for manufacturing the Pt/WO3 type hydrogen sensitive film which is a method for manufacturing platinum/tungsten oxide type hydrogen sensitive film equipped with a carrier comprising platinum catalyst and a tungsten oxide carrying the platinum catalyst has: a process A for mixing a precursor of tungstic acid and a platinum compound to prepare a sol-gel solution of tungstic acid; a process B for coating the surface of the base material with the sol-gel solution, a process C for drying the base material coated with the sol-gel solution to form the coating film on the surface of the base material, and a process D irradiating the coating film formed on the base material with ultraviolet rays under an atmosphere containing a reductive gas such as formaldehyde to form the platinum/tungsten oxide type hydrogen sensitive film on the surface of the base material.;COPYRIGHT: (C)2010,JPO&INPIT
机译:要解决的问题:提供一种制造Pt / WO 3 型氢敏感膜的方法,该方法能够在半导体衬底上形成Pt / WO 3 型氢敏感膜。解决方案:制造Pt / WO 3 型氢敏膜的方法,该方法是制造配备有包含铂的载体的铂/氧化钨型氢敏膜的方法催化剂和携带铂催化剂的氧化钨具有:将钨酸的前体与铂化合物混合以制备钨酸的溶胶-凝胶溶液的方法A;工序B,其用于利用溶胶凝胶溶液涂布基材的表面;工序C,用于使涂布有溶胶凝胶溶液的基材干燥,从而在基材的表面形成涂膜的工序;工序D在含有甲醛等还原性气体的气氛下,用紫外线照射基材上形成的涂膜,在基材表面上形成铂/氧化钨类氢敏感膜。版权所有:(C)2010,JPO&INPIT

著录项

  • 公开/公告号JP5152797B2

    专利类型

  • 公开/公告日2013-02-27

    原文格式PDF

  • 申请/专利权人 国立大学法人横浜国立大学;

    申请/专利号JP20080162365

  • 发明设计人 岡崎 慎司;

    申请日2008-06-20

  • 分类号G01N21/27;

  • 国家 JP

  • 入库时间 2022-08-21 16:53:58

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