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Plasma EUV light source which generates a high-repetition rate lasers

机译:产生高重复频率激光的等离子EUV光源

摘要

Generation of EUV light used and individual targets in the form of solid particles embedded in droplets or droplet or solid particles has been sent to the irradiation site for the [issue] a laser produced plasma, irradiation with a pulsed laser beam and to provide a system for. Supplying target forming system the individual targets, the target formation and supplying pulse laser the laser pulse is focused into the desired target ignition site [MEANS FOR SOLVING PROBLEMS] selected pulse repetition rate, the selection interval that has been adjusted to the laser pulse repetition rate to enable the target steering system in the middle of the target ignition site and desired system, that the target steering system directs the desired target ignition site targets, and information on the movement of the target between the target steering system and the target forming system and method EUV light source device may include a target tracking system providing. Target tracking system, each point including a collimating light source that is directed to provide the information to enable the creation of a laser firing control signals and can, so as to intersect with the points of the projected delivery path on the target drop detector having a light detector disposed opposite each for detecting passage of the target through, or can include a detector comprising a linear array of a plurality of photosensitive elements aligned with the coordinate axis, light from the light source, The projection intersects the delivery path of the target, one of which, it is possible to include a flat cut-off detector. Droplets plurality of detectors operating at optical frequencies, each different, or drop detector may include a camera and a two-dimensional array of pixels for imaging a field of view and the visual field. It can include equipment containment electrostatic plasma results in the field confinement plasma at or near the target ignition site upon ignition, the target tracking system, apparatus and method allows the control of the device containment electrostatic plasma I will provide a signal. The apparatus and method may comprise a container for maintaining a pressure differential across the low pressure trap by allowing passage of the EUV light by an intermediate wall with a low pressure trap. Methods and equipment, may include a mechanism confinement magnetic plasma that produces near the target ignition site a magnetic field for confining the target ignition site plasma can be controlled by using the output from the target tracking system is pulsed possible. [Selection] Figure Figure 1
机译:产生的EUV光的产生以及以小滴或小滴或固体颗粒形式嵌入的固体颗粒形式的单个目标已被发送到辐照部位,用于[发出]激光产生的等离子体,脉冲激光束辐照并提供一种系统对于。供给目标形成系统的各个目标,将目标形成和供给脉冲激光的激光脉冲聚焦到所需的目标点火部位[解决问题的手段]选定的脉冲重复率,已将选择间隔调整为激光脉冲重复率为了使目标转向系统位于目标点火部位和所需系统的中间,目标导向系统引导所需的目标点火部位目标,以及有关目标在目标导向系统和目标形成系统之间运动的信息,以及方法EUV光源设备可以包括提供的目标跟踪系统。目标跟踪系统,每个点都包括一个准直光源,用于提供信息以实现激光发射控制信号的产生,并且可以与目标液滴检测器上的投影传送路径上的点相交,目标液滴检测器具有与检测器相对放置的光检测器,用于检测目标的通过,或者可以包括检测器,该检测器包括与坐标轴对齐的多个光敏元件的线性阵列,来自光源的光,投影与目标的传输路径相交,其中之一,可以包括一个平截断检测器。在光频率下工作的多个检测器的液滴,每个检测器或液滴检测器可以包括照相机和用于对视场和视野成像的二维像素阵列。它可以包括设备安全壳静电等离子体在点火后导致目标点火位置处或附近的场约束等离子体,目标跟踪系统,设备和方法允许对设备安全壳静电等离子体的控制提供信号。该设备和方法可包括容器,该容器用于通过使EUV光通过具有低压阱的中间壁来维持低压阱两端的压差。方法和设备可包括限制在目标点火部位附近产生磁场以限制目标点火部位等离子体的磁场的机制,该磁场可通过使用来自目标跟踪系统的输出而被脉冲控制。 [选择]图图1

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