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LARGE SCALE PLATE AND METHOD FOR UNIFORMLY POLISHING LARGE SCALE PLATE

机译:大型板和均匀抛光大型板的方法

摘要

Disclosed is a substrate polishing method capable of minimizing a difference of polishing amounts between a center portion and a rim portion of a large scale plate during a plate polishing process.
机译:公开了一种能够在板抛光过程中最小化大型板的中心部分和边缘部分之间的抛光量差异的基板抛光方法。

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