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PASSIVE CAPACITIVELY-COUPLED ELECTROSTATIC (CCE) PROBE METHOD FOR DETECTING PLASMA INSTABILITIES IN A PLASMA PROCESSING CHAMBER
PASSIVE CAPACITIVELY-COUPLED ELECTROSTATIC (CCE) PROBE METHOD FOR DETECTING PLASMA INSTABILITIES IN A PLASMA PROCESSING CHAMBER
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机译:用于检测等离子体处理室中等离子体不稳定性的无源电容耦合静电(CCE)探头方法
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摘要
A method for detecting plasma instability within a processing chamber of a plasma processing system during substrate processing is provided. The method includes collecting a set of process data, the process data including a set of induced current signals flowing through a measuring capacitor. The method further includes converting the set of induced current signals into a set of analog voltage signals and converting the set of analog voltage signals into a set of digital signals. The method also includes analyzing the set of digital signals to detect high frequency perturbations, the high frequency perturbations indicating the plasma instability.
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