首页> 外国专利> OPTICAL APPARATUS, MEASURING APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

OPTICAL APPARATUS, MEASURING APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

机译:光学仪器,测量仪器,光刻技术和制造方法

摘要

The present invention provides an optical apparatus which detects an image of a mark on a substrate, the apparatus including an optical system configured to form an image of the mark, a detector configured to detect the image, wherein the optical system includes an aperture stop, an aperture, corresponding to a first field of view and a second field of view of the detector, being formed in the aperture stop, a light-shielding member, and a driving mechanism configured to position the light-shielding member so that one of the first field of view and the second field of view is valid, and a part of the other is invalid.
机译:本发明提供一种光学设备,其检测基板上的标记的图像,该设备包括:光学系统,被配置为形成标记的图像;检测器,其被配置为检测图像,其中,光学系统包括孔径光阑;在孔径光阑中形成有与检测器的第一视场和第二视场相对应的光圈,遮光构件和驱动机构,该驱动机构构造成将遮光构件定位成使得第一个视野和第二个视野有效,而另一个视野无效。

著录项

  • 公开/公告号US2013258095A1

    专利类型

  • 公开/公告日2013-10-03

    原文格式PDF

  • 申请/专利权人 CANON KABUSHIKI KAISHA;

    申请/专利号US201313835493

  • 发明设计人 TOSHIHIKO NISHIDA;WATARU YAMAGUCHI;

    申请日2013-03-15

  • 分类号G01B11/14;G03F7/20;

  • 国家 US

  • 入库时间 2022-08-21 16:49:47

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号