首页> 外国专利> CMOS DEVICES INCORPORATING HYBRID ORIENTATION TECHNOLOGY (HOT) WITH EMBEDDED CONNECTORS

CMOS DEVICES INCORPORATING HYBRID ORIENTATION TECHNOLOGY (HOT) WITH EMBEDDED CONNECTORS

机译:CMOS设备采用嵌入式连接器并入混合定位技术(HOT)

摘要

The present invention relates to complementary devices, such as n-FETs and p-FETs, which have hybrid channel orientations and are connected by conductive connectors that are embedded in a semiconductor substrate. Specifically, the semiconductor substrate has at least first and second device regions of different surface crystal orientations (i.e., hybrid orientations). An n-FET is formed at one of the first and second device regions, and a p-FET is formed at the other of the first and second device regions. The n-FET and the p-FET are electrically connected by a conductive connector that is located between the first and second device regions and embedded in the semiconductor substrate. Preferably, a dielectric spacer is first provided between the first and second device regions and recessed to form a gap therebetween. The conductive connector is then formed in the gap above the recessed dielectric spacer.
机译:互补器件技术领域本发明涉及互补器件,例如n-FET和p-FET,其具有混合沟道取向并且通过嵌入半导体衬底中的导电连接器连接。具体地说,半导体衬底至少具有表面晶体取向(即,混合取向)不同的第一和第二器件区域。在第一器件区域和第二器件区域中的一个处形成n-FET,并且在第一器件区域和第二器件区域中的另一个处形成p-FET。 n-FET和p-FET通过位于第一器件区域和第二器件区域之间并嵌入半导体衬底中的导电连接器电连接。优选地,首先在第一器件区域和第二器件区域之间提供介电间隔物,并且该介电间隔物凹陷以在它们之间形成间隙。然后,在凹进的电介质间隔物上方的间隙中形成导电连接器。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号