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METHOD OF FORMING ORIENTED BLOCK COPOLYMER LINE PATTERNS, BLOCK COPOLYMER LINE PATTERNS FORMED THEREBY, AND THEIR USE TO FORM PATTERNED ARTICLES
METHOD OF FORMING ORIENTED BLOCK COPOLYMER LINE PATTERNS, BLOCK COPOLYMER LINE PATTERNS FORMED THEREBY, AND THEIR USE TO FORM PATTERNED ARTICLES
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机译:定向嵌段共聚物线型的形成方法,由此形成的嵌段共聚物线型的形成方法及其在形成图案制品中的用途
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摘要
A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.
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