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Substrate structure including functional region and method for transferring functional region

机译:包括功能区的基板结构和转移功能区的方法

摘要

According to a method for transferring a functional region, at least part of functional regions on separation layers arranged on a first substrate is transferred onto a second substrate, the separation layers being capable of being brought into a separable state by treatment. In a first bonding step, the first substrate is bonded to the second substrate with a dry film resist arranged between the second substrate and the at least part of the functional regions above the first substrate. In an exposure step, at least part of the dry film resist is exposed. In a patterning step, the exposed dry film resist is patterned.
机译:根据用于转移功能区域的方法,将布置在第一基板上的隔离层上的功能区域的至少一部分转移到第二基板上,所述隔离层能够通过处理而变为可分离状态。在第一接合步骤中,利用布置在第二基板与第一基板上方的至少一部分功能区域之间的干膜抗蚀剂将第一基板接合至第二基板。在曝光步骤中,干膜抗蚀剂的至少一部分被曝光。在构图步骤中,对曝光的干膜抗蚀剂构图。

著录项

  • 公开/公告号US8513093B2

    专利类型

  • 公开/公告日2013-08-20

    原文格式PDF

  • 申请/专利权人 TAKAO YONEHARA;

    申请/专利号US201013395202

  • 发明设计人 TAKAO YONEHARA;

    申请日2010-09-14

  • 分类号H01L21/30;H01L21;

  • 国家 US

  • 入库时间 2022-08-21 16:47:28

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