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Technology migration for integrated circuits with radical design restrictions

机译:具有根本设计限制的集成电路技术的移植

摘要

A method, system and program product for migrating an integrated circuit (IC) design from a source technology without radical design restrictions (RDR) to a target technology with RDR, are disclosed. The invention implements a minimum layout perturbation approach that addresses the RDR requirements. The invention also solves the problem of inserting dummy shapes where required, and extending the lengths of the critical shapes and/or the dummy shapes to meet ‘edge coverage’ requirements.
机译:公开了一种用于将集成电路(IC)设计从无根本设计限制(RDR)的源技术迁移到具有RDR的目标技术的方法,系统和程序产品。本发明实现了解决RDR要求的最小布局扰动方法。本发明还解决了如下问题:在需要时插入虚拟形状,并延长关键形状和/或虚拟形状的长度以满足“边缘覆盖”要求。

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