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METHOD OF MANUFACTURING QUANTUM DOT LAYER AND QUANTUM DOT OPTOELECTRONIC DEVICE INCLUDING THE QUANTUM DOT LAYER

机译:制造量子点层的方法和包括量子点层的量子点光电子器件

摘要

A method of manufacturing a quantum dot layer, and a quantum dot optoelectronic device including the quantum dot layer. The method includes sequentially stacking a self-assembled monolayer, a sacrificial layer, and a quantum dot layer on a source substrate; disposing a stamp on the quantum dot layer; picking up the sacrificial layer, the quantum dot layer and the stamp; and removing the sacrificial layer from the quantum dot layer using a solution that dissolves the sacrificial layer.
机译:一种制造量子点层的方法以及包括该量子点层的量子点光电器件。该方法包括在源基板上顺序堆叠自组装单层,牺牲层和量子点层;在量子点层上设置印模;拾取牺牲层,量子点层和印模;使用溶解所述牺牲层的溶液从所述量子点层去除所述牺牲层。

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