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Dry dust removal method in organic chlorosilane production

机译:有机氯硅烷生产中的干法除尘方法

摘要

Dry dust removal method in organic chlorosilane production is provided, in which the detailed steps are as follows: delivering high-temperature flue gas (a) from fluidized bed reactor (I) into inorganic film cross-flow filter (E) to remove dust for the first time; delivering the concentrated dust gas (c) trapped by inorganic film cross-flow filter (II) into bag filter (III) to remove dust for the second time; returning the gas mixture (f) of passing through bag filter (EI) to the air intake of inorganic film cross-flow filter (II); condensing the residual clean gas (b) from the osmotic side of inorganic film in condenser (A), and then rectifying in rectifying column (B) to separate the products of chloromethane (g) and methyl chlorosilane (h) to obtain the product of methyl chlorosilane (h); returning chloromethane to fluidized bed reactor to take part in reaction; retreating the dust (e) trapped by inorganic film cross-flow filter and bag filter, and then returning it to fluidized bed reactor (I) to take part in reaction.
机译:提供了一种有机氯硅烷生产中的干法除尘方法,其详细步骤如下:将高温烟气(a)从流化床反应器(I)输送到无机膜错流过滤器(E)中以去除灰尘第一次;将被无机膜错流过滤器(II)捕集的浓尘气体(c)再次送入袋式过滤器(III)中,以去除灰尘。通过袋式除尘器(EI)的气体混合物(f)返回到无机膜错流式过滤器(II)的进气口;在冷凝器(A)中从无机膜的渗透侧冷凝残留的清洁气体(b),然后在精馏塔(B)中进行精馏,分离出氯甲烷(g)和甲基氯硅烷(h)的产物,从而得到甲基氯硅烷(h);使氯甲烷返回流化床反应器中进行反应;将被无机膜错流过滤器和袋式过滤器截留的灰尘(e)进行处理,然后将其返回到流化床反应器(I)中进行反应。

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