首页>
外国专利>
Modeling an arbitrarily polarized illumination source in an optical lithography system
Modeling an arbitrarily polarized illumination source in an optical lithography system
展开▼
机译:在光学光刻系统中建模任意偏振的照明源
展开▼
页面导航
摘要
著录项
相似文献
摘要
One embodiment of the present invention provides a system that accurately models polarization states of an illumination source in an optical lithography system for manufacturing integrated circuits. During operation, the system starts by receiving a two-dimensional (2D) grid map for an illumination source pupil in the optical lithography system. The system then constructs a source-polarization model for the illumination source by defining a polarization state at each grid point in the grid map. Next, the system enhances a lithography model for the optical lithography system by incorporating the source-polarization model into the lithography/OPC model.
展开▼