CHLORINE RESISTANCE POLYAMIDE-BASED REVERSE OSMOSIS MEMBRANE CONTAINING SURFACE REFORMED SILICA FOR A DESALINATING PROCESS AND A MANUFACTURING METHOD OF THE SAME CAPABLE OF UNIFORMLY COATING FUNCTIONAL GROUPS ON THE SURFACE OF SILICA NANOPARTICLES

摘要

PURPOSE: A chlorine resistance polyamide-based reverse osmosis membrane containing surface reformed silica for a desalinating process and a manufacturing method of the same are provided to increase the concentration of amine groups.;CONSTITUTION: A manufacturing method of a chlorine resistance polyamide-based reverse osmosis membrane containing surface reformed silica for a desalinating process includes the following steps: silica particles are dispersed in a solvent; an organosilane compound is added into the silica particle dispersed solution to generate silica of which surface is combined with the reactive group of the organosilane compound. Diaminobenzoic acid and 4-(4,6-dimethoxy-1,3,5-triazine-2-yl)-4-methylmorpolynium chloride catalyst are added to silica with the reactive group of the organosilane compound. Reformed silica is generated, and polyamide reactive groups are arranged on the surface of the silica.;COPYRIGHT KIPO 2013;[Reference numerals] (AA) Polyamide activating layer; (BB) Polysulfone UF supporting layer; (CC) Polysulfone UF supporting layer; (DD) SiO_2 inorganic nanoparticles