首页> 外国专利> TEXTURING AGENT COMPOSITIONS OF SINGLE CRYSTALLINE SILICON WAFERS FOR SOLAR CELL AND TEXTURING METHOD USING THE SAME

TEXTURING AGENT COMPOSITIONS OF SINGLE CRYSTALLINE SILICON WAFERS FOR SOLAR CELL AND TEXTURING METHOD USING THE SAME

机译:太阳能单晶硅晶圆的织构剂组成及使用该方法的织构方法

摘要

PURPOSE: A texturing agent composition for a single crystal silicon wafer for a solar cell and a texturing method using the same are provided to eliminate hydrogen bubbles which stick on the surface of the silicon wafer by containing silicic alkali metal salts and water-soluble resin with a controllable etching rate. CONSTITUTION: A texturing agent composition comprises silicic alkali metal salts and water-soluble resin. The silicic alkali metal salts is formed of potassium silicate, lithium silicate, and tetra sodium silicate. The silicic alkali metal salts is composed of hexasodium disilicate group and a disodium silicate group. A potassium hydroxide solution of 45% and texturing agent are mixed in ion exchanged water(S1). The mixture is vertically used to etch and texture the surface of a wafer(S2). [Reference numerals] (S1) Step of mixing a potassium hydroxide solution and a texturing agent with ion exchanged water; (S2) Step of texturing the mixture by vertically etching the mixture on the surface of a single crystal silicon wafer
机译:目的:提供用于太阳能电池的单晶硅晶片的纹理化剂组合物和使用该组合物的纹理化方法,以通过含有硅碱金属盐和水溶性树脂来消除粘附在硅晶片表面的氢气泡。可控制的蚀刻速率。组成:膨松剂组合物包含硅碱金属盐和水溶性树脂。硅碱金属盐由硅酸钾,硅酸锂和四硅酸钠形成。硅碱金属盐由二硅酸六钠基团和硅酸二钠基团组成。将45%的氢氧化钾溶液和变形剂在离子交换水中混合(S1)。将该混合物垂直用于蚀刻晶片表面并使之纹理化(S2)。 [附图标记](S1)将氢氧化钾溶液和变形剂与离子交换水混合的步骤; (S2)通过在单晶硅晶片的表面上垂直蚀刻混合物来使混合物纹理化的步骤

著录项

  • 公开/公告号KR101213147B1

    专利类型

  • 公开/公告日2012-12-18

    原文格式PDF

  • 申请/专利权人 JINBO CO. LTD.;

    申请/专利号KR20120101659

  • 发明设计人 KANG JEON TAEK;KANG JI WON;

    申请日2012-09-13

  • 分类号H01L21/306;H01L31/042;

  • 国家 KR

  • 入库时间 2022-08-21 16:27:59

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号