MANUFACTURING METHOD OF IMPRINT RESINS CAPABLE OF PERFORMING NANO IMPRINT TECHNOLOGY UNDER LOW TEMPERATURE AND LOW PRESSURE CONDITION AND AN IMPRINTING METHOD

摘要

PURPOSE: A manufacturing method of imprint resins and an imprinting method are provided to reduce processing cost and processing time.;CONSTITUTION: A manufacturing method of imprint resins comprises the following steps: (S11) providing a solvent in which nanoparticles are dispersed; (S12) mixing the solvent with monomer resin; and (S13) adding ultraviolet initiator or thermal initiator to a solvent in which the monomer resin is mixed. The imprinting method comprises the following steps: preparing a substrate in which resin is coated on the top surface; preparing polymer mold in which uneven pattern is formed; transcribing the polymer mold pattern to the resin after contacting the polymer mold with the resin; separating the substrate from the polymer mold; and heat-treating the substrate.;COPYRIGHT KIPO 2013;[Reference numerals] (S11) Dispersing nanoparticles in a solvent; (S12) Mixing the solvent with a monomer resin; (S13) Adding ultraviolet/thermal initiators in the solvent