首页> 外国专利> TRANSPARENT GAS BARRIER FILM WITH INORGANIC COMPOSITION GRADIENT WITHOUT SUDDEN CHANGE OF PHYSICAL PROPERTIES BETWEEN LAYERS, AND A MANUFACTURING METHOD THEREOF

TRANSPARENT GAS BARRIER FILM WITH INORGANIC COMPOSITION GRADIENT WITHOUT SUDDEN CHANGE OF PHYSICAL PROPERTIES BETWEEN LAYERS, AND A MANUFACTURING METHOD THEREOF

机译:具有无机组成梯度且层间物理特性没有突然变化的透明阻气膜及其制造方法

摘要

PURPOSE: A manufacturing method of a transparent gas barrier film is provided to manufacture the transparent gas barrier film with inorganic composition gradient by only a simple plasma surface treatment without vacuum deposition of an organic-inorganic hybrid layer.;CONSTITUTION: A transparent gas barrier film is a substrate with 70% or more inorganic concentration. The transparent gas barrier film has an organic-inorganic hybrid section with inorganic composition gradient becoming lower toward the center of the substrate. A manufacturing method of the transparent gas barrier film comprises a step of preparing a substrate which includes silicon; and a step of treating the surface of the substrate with reactive gas plasma, to form the inorganic composition gradient.;COPYRIGHT KIPO 2013
机译:目的:提供一种透明阻气膜的制造方法,以仅通过简单的等离子表面处理而无需真空沉积有机-无机杂化层来制造具有无机成分梯度的透明阻气膜。组成:透明阻气膜是具有70%或更高无机浓度的底物。透明阻气膜具有有机-无机混合部分,其无机组成梯度朝向基板的中心降低。透明阻气膜的制造方法包括准备包含硅的基板的步骤。 ;以及用反应性气体等离子体处理衬底表面以形成无机成分梯度的步骤。; COPYRIGHT KIPO 2013

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