SILVER OR SILVER ALLOY ETCHANT FOR WIRING AND A REFLECTION LAYER, CAPABLE OF CONDUCTING UNIFORM ETCHING REGARDLESS OF THE SIZE OF A SUBSTRATE

摘要

PURPOSE: An etching solution is provided to have excellent etching performance, sufficient etching rate, thereby obtaining a profile which is suitable for large amount production.;CONSTITUTION: A silver or silver alloy etchant for wiring and a reflection layer is for etching a single layer or multilayer. The etchant solution comprises 30-50 weight% of phosphoric acid, 2-10 weight% of nitric acid, 5-40 weight% of acetic acid, 0.1-10 weight% of an etching performance improver, and residual water, based on the total weight of the composition. The etching performance improver is a phosphate and is selected from a group that at least one hydrogen atom of the phosphate is substituted by an ammonium salt, alkali metal, or alkali earth metal.;COPYRIGHT KIPO 2013