MONITORING METHOD AND APPARATUS FOR ELECTRON ENERGY DISTRIBUTION CHARACTERISTICS OF PLASMA

摘要

PURPOSE: A variation monitoring method of an electronic energy distribution property and an apparatus including the same are provided to shorten a calculation time by calculating an EEDFElectron Energy Distribution Function in a simple method by utilizing an OESOptical Emission Spectroscopy signal. CONSTITUTION: A mathematical modeling about a light intensity is established(S110). An EEDF is measured based on the established mathematical modeling(S120). A monitoring about a process plasma state is performed based on the variation of the measured EEDF(S130). [Reference numerals] (AA) Start; (BB) End; (S110) Establish mathematical modeling about light intensity; (S120) Measure an EEDF based on the mathematical modeling; (S130) Perform a monitoring about a process plasma state based on the variation of the EEDF