首页> 外国专利> PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING A SPACER AND A SPACER MANUFACTURED BY THE SAME CAPABLE OF IMPROVING SOLVENT RESISTANCE PROPERTIES AND HEAT RESISTANCE PROPERTIES

PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING A SPACER AND A SPACER MANUFACTURED BY THE SAME CAPABLE OF IMPROVING SOLVENT RESISTANCE PROPERTIES AND HEAT RESISTANCE PROPERTIES

机译:用于形成间隔物的光敏树脂组合物和以提高耐溶剂性和耐热性的能力相同的方式制造的间隔物

摘要

PURPOSE: A photosensitive resin composition for forming a spacer and a spacer manufactured by the same are provided to improve the elastic recovery rate of the spacer.;CONSTITUTION: A photosensitive resin composition for forming a spacer includes an oxime ester-based photo-initiator which is represented by chemical formula 1. The composition further includes one or more photo-initiators selected from a group including a triazine-based compound, an acetophenone-based compound, a biimidazol-based compound, an oxime-based compound, a benzoin-based compound, a benzophenone-based compound, a thioxanthone-based compound, and an anthracene-based compound. The composition further includes an alkali soluble resin, photo-curable monomer, and a solvent. The spacer is made of the composition. The spacer is used for an image display device.;COPYRIGHT KIPO 2013
机译:用途:提供用于形成隔离物的光敏树脂组合物和由其制备的隔离物,以提高隔离物的弹性回复率。由化学式1表示。组合物还包含一种或多种光引发剂,其选自三嗪类化合物,苯乙酮类化合物,联苯咪唑类化合物,肟类化合物,苯偶姻类化合物。化合物,二苯甲酮基化合物,噻吨酮基化合物和蒽基化合物。该组合物还包含碱溶性树脂,光固化性单体和溶剂。间隔物由该组合物制成。间隔件用于图像显示设备。; COPYRIGHT KIPO 2013

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