首页> 外国专利> APPARATUS OF REMOVING MG ALLOY ADHERED TO EXTRUDING MOLD AND COMPOSITION OF CORROSION SOLUTION FOR REMOVING THE MG ALLOY

APPARATUS OF REMOVING MG ALLOY ADHERED TO EXTRUDING MOLD AND COMPOSITION OF CORROSION SOLUTION FOR REMOVING THE MG ALLOY

机译:去除附着在铸模上的MG合金的装置以及用于去除MG合金的腐蚀液的成分

摘要

PURPOSE: A device for removing a magnesium alloy adhering to a mold for an extrusion and a composition of an etching solution for removing the magnesium alloy are provided to remove completely the magnesium alloy adhering to the mold for the extrusion regardless of a shape of a cavity. CONSTITUTION: A device for removing a magnesium alloy adhering to a mold for an extrusion comprises an etching bath (30) and an etching solution supply unit. The etching bath removes magnesium included in the magnesium alloy by a corrosion response, and an etching solution which is a basic or a neutral is filled. The etching solution supply unit supplies the etching solution to the etching bath from an outside of the etching bath. The etching solution supply unit comprises multiple fluid paths for supplying the etching solution and multiple containers. The etching solution supply unit comprises a first container (22) and a first fluid path (14) for supplying a first solution producing the corrosion response in the magnesium to the etching bath.
机译:目的:提供一种用于去除粘附在挤压模具上的镁合金的装置和一种用于移除镁合金的蚀刻溶液的成分,以完全移除粘附在用于挤压模具的镁合金上,而不管腔的形状如何。 。构成:一种用于去除粘附在挤压模具上的镁合金的装置,其包括蚀刻浴(30)和蚀刻溶液供应单元。蚀刻浴通过腐蚀响应除去镁合金中包含的镁,并填充碱性或中性的蚀刻溶液。蚀刻液供给部从蚀刻槽的外部向蚀刻槽供给蚀刻液。蚀刻溶液供应单元包括用于供应蚀刻溶液的多个流体路径和多个容器。蚀刻溶液供应单元包括第一容器(22)和第一流体路径(14),第一流体路径(14)用于向蚀刻浴中供应在镁中产生腐蚀响应的第一溶液。

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