APPLYING THE IR LASER BEAM DIFFRACTION EXTINCTION WITH OFFSET FUNCTION EUV LIGHT GENERATING DEVICE

摘要

PURPOSE: A device for generating extreme ultra violet light having an infrared (IR) laser beam offsetting function which applies diffraction extinction is provided to firstly offset an IR femtosecond laser through a diffractive optical element and to secondly offset the IR femtosecond laser through a pinhole, thereby preventing the damage of the diffractive optical element. CONSTITUTION: A laser source (100) outputs a laser beam. A tunable laser mirror (TLM) (220) reflects the laser beam outputted from the laser source. A focusing mirror (FM) (230) focuses the laser beam reflected from the TLM. A gas cell (240) receives the laser beam of the FM and generates extreme ultraviolet rays by forming plasma with response gases. A diffractive optical element (250) is positioned in a progress direction of the extreme ultraviolet light of the gas cell. The diffractive optical element offsets the intensity of the beam of the extreme ultraviolet light. A pinhole (260) passes only the extreme ultraviolet light. Vacuum chambers (200,210) receive the TLM, the FM, the gas cell, the diffractive optical element, and the pinhole in a vacuum state.