PURPOSE: An aromatic ring-containing polymer and composition for resist lower layer are provided to minimize reflection between resist and backside layer and to ensure multi-etching resistance. CONSTITUTION: An aromatic ring-containing polymer contains a repeat unit of chemical formulas 1, 2, and 3. In chemical formula 1, R1 is selected from a group consisting of hydrogen, hydroxyl group, halogen group, substituted or non-substituted alkyl group, substituted or non-substituted aryl group, and substituted or non-substituted heteroaryl group; R2-R5 are same or different hydrogen, hydroxyl group, halogen group, substituted or non-substituted alkyl group, substituted or non-substituted aryl group, substituted or non-substituted hetero aryl group; and A is single bond, substituted or non-substituted arylene group, and substituted or non-substituted straight or branched alkylene group.
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