ETCHING SOLUTION FOR EXPOSURE OF AUSTENITE GRAIN SIZE AND METHOD FOR EXPOSURE OF AUSTENITE GRAIN SIZE USING THEREOF

摘要

PURPOSE: An etching solution for observation of austenite grains and a method for etching a specimen using the same are provided to prevent damage to grains due to initial rapid etching by implementing etching in two stages. CONSTITUTION: A method for etching a specimen for observation of austenite grains comprises the steps of: dipping a specimen in a first etching solution, which comprises picric acid-saturated aqueous solution of 57.5-61.9vol.%, copper chloride of 0.1-0.5vol.%, and wetting agent of 38-42vol.%, to remove foreign materials from the surface of the specimen, adding hydrochloric acid of 0.01-0.05vol.% to the first etching solution of 100wt.% to obtain a second etching solution, dipping the specimen in the second etching solution, proceeding an etching process until an etching film is covered on the entire surface of the specimen from the second etching solution, and washing to remove the etching film from the specimen.