APPARATUS FOR MEASURING THE CONTAMINATION OF A CONVEYING ENCLOSURE AND A MEASURING METHOD USING THE SAME CAPABLE OF IMPROVING THE RELIABILITY OF MEASUREMENT

摘要

PURPOSE: An apparatus for measuring the contamination of a conveying enclosure and a measuring method using the same are provided to prevent the fault of a wafer by removing contaminants formed in a gas suction pipe.;CONSTITUTION: A conveying enclosure(100) includes a gas inlet and a gas outlet. The gas inlet is connected to the outside. An analyzer(200) measures contamination through a gas suction pipe(300). The gas suction pipe is connected to the gas outlet. An inactive gas or a cleaning solution is supplied to the gas suction pipe.;COPYRIGHT KIPO 2013;[Reference numerals] (410) Inactive gas; (420) Cleaning solution