METHOD FOR REMOVING A LIQUID FILM USING A HIGH SPEED PARTICLE BEAM, CAPABLE OF SIMULTANEOUSLY REMOVING CLEANING WATER AND IMPURITIES REMAINING IN AN OBJECT AFTER A WET CLEANING PROCESS

摘要

PURPOSE: A method for removing a liquid film using a high speed particle beam is provided to prevent environmental contamination by reducing a chemical wastewater without an additional wet cleaning process for removing residue.;CONSTITUTION: A method for removing a liquid film using a high speed particle beam comprises a wet cleaning process and a dry cleaning process. The dry cleaning process comprises: a step of generating nucleus by rapidly expanding particle generating gas passing through an orifice equipped on a nozzle throat of a nozzle(10); a step of generating a sublimating particle by growing the nucleus passing through a first expansion unit connected from an exit of the nozzle throat; and a step of increasing speed of spraying the sublimating particle while offsetting the growth of a boundary layer and passing through a second expansion unit.;COPYRIGHT KIPO 2013