ELECTRON BEAM DEPOSITING DEVICE AND A DEPOSITING METHOD USING THE SAME, CAPABLE OF EFFECTIVELY DEPOSITING METAL HAVING A HIGH MELTING POINT ON A SUBSTRATE BY USING ELECTRON BEAMS

摘要

PURPOSE: An electron beam depositing device and a depositing method using the same are provided to include a heater heating a substrate and an electron beam evaporating a source within a single chamber, thereby depositing and heating at the same time.;CONSTITUTION: An electron beam depositing device includes a substrate, a chamber (110), an electric gun (120), a source (30), a heater, and a shield member (140). The circular or a rectangular substrate is arranged between the electric gun and the source. The chamber includes an internal space. The vacuum state of the inside of the chamber can be maintained, and argon and oxygen can be supplied to the internal space of the chamber. The electric gun is mounted on the top of the chamber and emits electron beams. The source is mounted on the underside of the chamber. The heater is mounted on the rear surface of the substrate and heats the substrate. The shield member is mounted between the substrate and the heater and shields electromagnetic waves generated by the heater.;COPYRIGHT KIPO 2013