首页> 外国专利> Physical vapor deposition of decorative and/or protective coating on substrate e.g. watch casing, by depositing underlayer, in inert atmosphere, on substrate, and progressively adding hydrocarbon gas to atmosphere to obtain stack of layers

Physical vapor deposition of decorative and/or protective coating on substrate e.g. watch casing, by depositing underlayer, in inert atmosphere, on substrate, and progressively adding hydrocarbon gas to atmosphere to obtain stack of layers

机译:装饰性和/或保护性涂层在基材上的物理气相沉积观察表壳,方法是在惰性气氛中在衬底上沉积一层底层,然后向大气中逐渐添加烃类气体,以获得多层

摘要

The method comprises depositing an underlayer (21), in an inert atmosphere, on a substrate (35) by pulverization or using magnetron sources, progressively adding a hydrocarbon gas to the inert atmosphere according to a profile of determined concentration by maintaining active sources or magnetron sources to obtain a stack of layers (15) with a gradually increasing proportion of carbon, and increasing a partial pressure of reactive gas to a saturation level at which an amorphous carbon layer (12) is deposited. The method comprises depositing an underlayer (21), in an inert atmosphere, on a substrate (35) by pulverization or using magnetron sources, progressively adding a hydrocarbon gas to the inert atmosphere according to a profile of determined concentration by maintaining active sources or magnetron sources to obtain a stack of layers (15) with a gradually increasing proportion of carbon, increasing a partial pressure of reactive gas to a saturation level at which an amorphous carbon layer (12) is deposited, maintaining the partial pressure at the saturation level until obtaining a desired thickness of coating, applying a negative polarization or pulsed direct current on the substrate, and detecting the saturation level by monitoring a layer deposition speed or by observing electric parameters of magnetron sources. The underlayer has a thickness of 200-500 nm. The deposition speed of stack of layers and/or carbon layer is 400-800 nm/hour.
机译:该方法包括通过粉碎或使用磁控管源在惰性气氛中在衬底(35)上沉积底层(21),通过保持活性源或磁控管根据确定的浓度曲线将烃气体逐步添加到惰性气氛中。气体源获得具有逐渐增加的碳比例的层(15)的堆叠,并将反应气体的分压增加到饱和水平,在该饱和水平上沉积无定形碳层(12)。该方法包括通过粉碎或使用磁控管源在惰性气氛中在衬底(35)上沉积底层(21),通过保持活性源或磁控管根据确定的浓度曲线将烃气体逐步添加到惰性气氛中。源获得具有逐渐增加的碳比例的层(15)的堆叠,将反应气体的分压增加到饱和水平,在该饱和水平下沉积无定形碳层(12),将分压保持在饱和水平,直到获得期望的涂层厚度,在基板上施加负极化或脉冲直流电,并通过监视层沉积速度或通过观察磁控管源的电参数来检测饱和度。底层具有200-500nm的厚度。层和/或碳层的堆叠的沉积速度为400-800nm /小时。

著录项

  • 公开/公告号CH705576B1

    专利类型

  • 公开/公告日2013-04-15

    原文格式PDF

  • 申请/专利权人 SERGE BOURQUARD;

    申请/专利号CH20120001921

  • 发明设计人 SERGE BOURQUARD;

    申请日2012-10-10

  • 分类号C23C16/26;

  • 国家 CH

  • 入库时间 2022-08-21 16:22:43

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