首页>
外国专利>
Device for thermally treating wet substrate to increase dry substance content of substrate, for thermal treatment of e.g. sewage sludge, has outlet controlling amount of partially moisture-reduced substrate present in drying chamber
Device for thermally treating wet substrate to increase dry substance content of substrate, for thermal treatment of e.g. sewage sludge, has outlet controlling amount of partially moisture-reduced substrate present in drying chamber
The device has a centrifugal shaft (f) arranged in a housing, an inlet for a web substrate (e), and an outlet for a partially moisture-reduced substrate (g). A conveying device is arranged on the shaft for fragmented conveyance of a wet substrate in a drying chamber. The drying chamber comprises an inlet and an outlet for drying air. The drying chamber is designed for inputting thermal energy. The former outlet is designed to control an amount of the partially moisture-reduced substrate present in the drying chamber. An independent claim is also included for a method for thermally treating a wet substrate to increase a dry substance content of the substrate.
展开▼