首页> 外国专利> Device for thermally treating wet substrate to increase dry substance content of substrate, for thermal treatment of e.g. sewage sludge, has outlet controlling amount of partially moisture-reduced substrate present in drying chamber

Device for thermally treating wet substrate to increase dry substance content of substrate, for thermal treatment of e.g. sewage sludge, has outlet controlling amount of partially moisture-reduced substrate present in drying chamber

机译:用于热处理湿的基材以增加基材的干物质含量的设备,用于例如热处理。污水污泥,其出口控制干燥室中部分减少水分的基质的数量

摘要

The device has a centrifugal shaft (f) arranged in a housing, an inlet for a web substrate (e), and an outlet for a partially moisture-reduced substrate (g). A conveying device is arranged on the shaft for fragmented conveyance of a wet substrate in a drying chamber. The drying chamber comprises an inlet and an outlet for drying air. The drying chamber is designed for inputting thermal energy. The former outlet is designed to control an amount of the partially moisture-reduced substrate present in the drying chamber. An independent claim is also included for a method for thermally treating a wet substrate to increase a dry substance content of the substrate.
机译:该装置具有布置在壳体中的离心轴(f),用于网状衬底的入口(e)和用于部分减少水分的衬底的出口(g)。输送装置布置在轴上,用于在干燥室中分散输送湿的基材。干燥室包括用于干燥空气的入口和出口。干燥室设计用于输入热能。前者出口被设计成控制存在于干燥室中的部分减少水分的基质的量。还包括用于热处理湿基材以增加基材的干物质含量的方法的独立权利要求。

著录项

  • 公开/公告号CH706450A2

    专利类型

  • 公开/公告日2013-10-31

    原文格式PDF

  • 申请/专利权人 MICHAEL GEISINGER;

    申请/专利号CH20120000586

  • 发明设计人 MICHAEL GEISINGER;

    申请日2012-04-29

  • 分类号F26B17/24;

  • 国家 CH

  • 入库时间 2022-08-21 16:22:44

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